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Hydrofluoric acid is a solution of hydrogen fluoride (HF) in water. Solutions of HF are colorless, acidic and highly corrosive . A common concentration is 49% (48-52%) but there are also stronger solutions (e.g. 70%) and pure HF has a boiling point near room temperature.
Aqueous solutions of HF are called hydrofluoric acid. When dilute, hydrofluoric acid behaves like a weak acid, unlike the other hydrohalic acids, due to the formation of hydrogen-bonded ion pairs [H 3 O + ·F −]. However concentrated solutions are strong acids, because bifluoride anions are predominant, instead
Hydrofluoric acid is a weak acid in aqueous solution (pK a = 3.15) [7] but a very weak acid in the gas phase (E pa (F −) = 1554 kJ/mol): [4] the fluoride ion is as strong a base as SiH 3 − in the gas phase, but its basicity is reduced in aqueous solution because it is strongly hydrated, and therefore stabilized.
In an aqueous solution the hydrogen ions (H +) and hydroxide ions (OH −) are in Arrhenius balance ([H +] [OH −] = K w = 1 x 10 −14 at 298 K). Acids and bases are aqueous solutions, as part of their Arrhenius definitions. [1] An example of an Arrhenius acid is hydrogen chloride (HCl) because of its dissociation of the hydrogen ion when ...
Unlike other hydrohalic acids, such as hydrochloric acid, hydrogen fluoride is only a weak acid in water solution, with acid dissociation constant (pK a) equal to 3.19. [36] HF's weakness as an aqueous acid is paradoxical considering how polar the HF bond is, much more so than the bond in HCl, HBr, or HI. The explanation for the behavior is ...
This neutralization reaction forms hydrogen fluoride (HF), the conjugate acid of fluoride. In aqueous solution, fluoride has a pK b value of 10.8. It is therefore a weak base, and tends to remain as the fluoride ion rather than generating a substantial amount of hydrogen fluoride. That is, the following equilibrium favours the left-hand side in ...
The optional second step (for bare silicon wafers) is a short immersion in a 1:100 or 1:50 solution of aqueous HF (hydrofluoric acid) at 25 °C for about fifteen seconds, in order to remove the thin oxide layer and some fraction of ionic contaminants. If this step is performed without ultra high purity materials and ultra clean containers, it ...
Fluoroboric acid is corrosive and attacks the skin. It is available commercially as a solution in water and other solvents such as diethyl ether. It is a strong acid with a weakly coordinating, non-oxidizing conjugate base. [2] It is structurally similar to perchloric acid, but lacks the hazards associated with oxidants.