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Ion implantation setup with mass separator. Ion implantation equipment typically consists of an ion source, where ions of the desired element are produced, an accelerator, where the ions are electrostatically accelerated to a high energy or using radiofrequency, and a target chamber, where the ions impinge on a target, which is the material to be implanted.
Ion Implantation is a technique extensively used in the field of materials science for material modification. The effect it has on nanomaterials allows manipulation of mechanical, electronic, morphological, and optical properties. [1]
Ion plating (IP) is a physical vapor deposition (PVD) process that is sometimes called ion assisted deposition (IAD) or ion vapor deposition (IVD) and is a modified version of vacuum deposition. Ion plating uses concurrent or periodic bombardment of the substrate, and deposits film by atomic-sized energetic particles called ions .
Electron capture ionization (ECI) is the ionization of a gas phase atom or molecule by attachment of an electron to create an ion of the form A −•.The reaction is + where the M over the arrow denotes that to conserve energy and momentum a third body is required (the molecularity of the reaction is three).
PIII-process with ECR-plasma source and magnetron. Plasma-immersion ion implantation (PIII) [1] or pulsed-plasma doping (pulsed PIII) is a surface modification technique of extracting the accelerated ions from the plasma by applying a high voltage pulsed DC or pure DC power supply and targeting them into a suitable substrate or electrode with a semiconductor wafer placed over it, so as to ...
At low energy molecular ion beams are deposited intact (ion soft landing), while at a high deposition energy molecular ions fragment and atomic ions can penetrate further into the material, a process known as ion implantation. [4] Ion optics (such as radio frequency quadrupoles) can be mass selective. In IBD they are used to select a single, or ...
The article Intevac Receives First Production Order for ENERGi Ion Implantation originally appeared on Fool.com. Try any of our Foolish newsletter services free for 30 days .
Focused ion beam, also known as FIB, is a technique used particularly in the semiconductor industry, materials science and increasingly in the biological field for site-specific analysis, deposition, and ablation of materials.