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Purification in a chemical context is the physical separation of a chemical substance of interest from foreign or contaminating substances. Pure results of a successful purification process are termed isolate. The following list of chemical purification methods should not be considered exhaustive.
The RCA clean is a standard set of wafer cleaning steps which need to be performed before high-temperature processing steps (oxidation, diffusion, CVD) of silicon wafers in semiconductor manufacturing. Werner Kern developed the basic procedure in 1965 while working for RCA, the Radio Corporation of America.
Water vapor is a key ingredient in the wet oxidation recipe. During a typical process, a furnace containing multiple wafers is flooded with water vapor. The oxygen in the water molecule reacts within the silicon wafer to form silicon dioxide. This is a sacrificial process, where the original substrate is reduced as the oxide forms on its surface.
Purified water is usually produced by the purification of drinking water or ground water. The impurities that may need to be removed are: inorganic ions (typically monitored as electrical conductivity or resistivity or specific tests) organic compounds (typically monitored as TOC or by specific tests)
Liquid Nitrogen Wash is a process mainly used for the production of ammonia synthesis gas within fertilizer production plants. It is usually the last purification step in the ammonia production process sequence upstream of the actual ammonia production .
In manufacturing, the simulated moving bed (SMB) process is a highly engineered process for implementing chromatographic separation. It is used to separate one chemical compound or one class of chemical compounds from one or more other chemical compounds to provide significant quantities of the purified or enriched material at a lower cost than could be obtained using simple (batch ...
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