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It is known as "Blech length". [2] Any wire that has a length below this limit will have a stretched limit for electromigration. Here, a mechanical stress buildup causes an atom back flow process which reduces or even compensates the effective material flow towards the anode. The Blech length must be considered when designing test structures to ...
Black's Equation is a mathematical model for the mean time to failure (MTTF) of a semiconductor circuit due to electromigration: a phenomenon of molecular rearrangement (movement) in the solid phase caused by an electromagnetic field.
The source free equations can be written by the action of the exterior derivative on this 2-form. But for the equations with source terms (Gauss's law and the Ampère-Maxwell equation), the Hodge dual of this 2-form is needed. The Hodge star operator takes a p-form to a (n − p)-form, where n is the number of dimensions.
The Nernst–Planck equation is a conservation of mass equation used to describe the motion of a charged chemical species in a fluid medium. It extends Fick's law of diffusion for the case where the diffusing particles are also moved with respect to the fluid by electrostatic forces.
The length of a sinusoidal wave is commonly expressed as an angle, in units of degrees (with 360° in a wavelength) or radians (with 2π radians in a wavelength). So alternately the electrical length can be expressed as an angle which is the phase shift of the wave between the ends of the conductor [1] [3] [5]
Electrochemical migration (ECM) is the dissolution and movement of metal ions in presence of electric potential, which results in the growth of dendritic structures between anode and cathode.
Differential 0-forms, 1-forms, and 2-forms are special cases of differential forms. For each k , there is a space of differential k -forms, which can be expressed in terms of the coordinates as ∑ i 1 , i 2 … i k = 1 n f i 1 i 2 … i k d x i 1 ∧ d x i 2 ∧ ⋯ ∧ d x i k {\displaystyle \sum _{i_{1},i_{2}\ldots i_{k}=1}^{n}f_{i_{1}i_{2 ...
The Transfer Length Method or the "Transmission Line Model" (both abbreviated as TLM) is a technique used in semiconductor physics and engineering to determine the specific contact resistivity between a metal and a semiconductor.