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The Universal Verification Methodology (UVM) is a standardized methodology for verifying integrated circuit designs. UVM is derived mainly from OVM (Open Verification Methodology) which was, to a large part, based on the eRM (e Reuse Methodology) for the e verification language developed by Verisity Design in 2001.
Bugs, or defects, can include issues like missing features (comparing the layout to the specification), errors in design (typo and functional errors), etc. When the coverage reaches a maximum percentage then the verification team will sign it off. By using a methodology like UVM, OVM, or VMM, the verification team develops a reusable environment.
Physical verification is a process whereby an integrated circuit layout (IC layout) design is verified via EDA software tools to ensure correct electrical and logical functionality and manufacturability. Verification involves design rule check (DRC), layout versus schematic (LVS), XOR (exclusive OR), antenna checks and electrical rule check ...
Very-large-scale integration (VLSI) is the process of creating an integrated circuit (IC) by combining millions or billions of MOS transistors onto a single chip. VLSI began in the 1970s when MOS integrated circuit (metal oxide semiconductor) chips were developed and then widely adopted, enabling complex semiconductor and telecommunications technologies.
The Open Verification Methodology (OVM) is a documented methodology with a supporting building-block library for the verification of semiconductor chip designs. The initial version, OVM 1.0, was released in January, 2008, [ 1 ] and regular updates have expanded its functionality.
This process is called formal equivalence checking and is a problem that is studied under the broader area of formal verification. A formal equivalence check can be performed between any two representations of a design: RTL <> netlist, netlist <> netlist or RTL <> RTL, though the latter is rare compared to the first two.
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VLSI layout of an inverter circuit using Magic software. Magic is an electronic design automation (EDA) layout tool for very-large-scale integration (VLSI) integrated circuit (IC) originally written by John Ousterhout and his graduate students at UC Berkeley. Work began on the project in February 1983.