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  2. Integrated circuit layout - Wikipedia

    en.wikipedia.org/wiki/Integrated_circuit_layout

    Layout view of a simple CMOS operational amplifier. In integrated circuit design, integrated circuit (IC) layout, also known IC mask layout or mask design, is the representation of an integrated circuit in terms of planar geometric shapes which correspond to the patterns of metal, oxide, or semiconductor layers that make up the components of the integrated circuit.

  3. Photomask - Wikipedia

    en.wikipedia.org/wiki/Photomask

    A photomask (also simply called a mask) is an opaque plate with transparent areas that allow light to shine through in a defined pattern. Photomasks are commonly used in photolithography for the production of integrated circuits (ICs or "chips") to produce a pattern on a thin wafer of material (usually silicon ).

  4. Aligner (semiconductor) - Wikipedia

    en.wikipedia.org/wiki/Aligner_(semiconductor)

    In a mask aligner, there is a one-to-one correspondence between the mask pattern and the wafer pattern. The mask covers the entire surface of the wafer which is exposed in its entirety in one shot. This was the standard for the 1:1 mask aligners that were succeeded by steppers and scanners with reduction optics. [4]

  5. Multiple patterning - Wikipedia

    en.wikipedia.org/wiki/Multiple_patterning

    Spacer mask: first pattern; deposition; spacer formation by etching; first pattern removal; etching with spacer mask; final pattern. In spacer patterning, a spacer is a film layer formed on the sidewall of a pre-patterned feature. A spacer is formed by deposition or reaction of the film on the previous pattern, followed by etching to remove all ...

  6. Hardmask - Wikipedia

    en.wikipedia.org/wiki/Hardmask

    Use of a hardmask involves an additional deposition process, and hence additional cost. First, the hardmask material is deposited and etched into the required pattern using a standard photoresist process. Following that the underlying material can be etched through the hardmask. Finally the hardmask is removed with a further etching process. [2]

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  8. Mask data preparation - Wikipedia

    en.wikipedia.org/wiki/Mask_data_preparation

    Mask data preparation (MDP), also known as layout post processing, is the procedure of translating a file containing the intended set of polygons from an integrated circuit layout into set of instructions that a photomask writer can use to generate a physical mask. Typically, amendments and additions to the chip layout are performed in order to ...

  9. Coded aperture - Wikipedia

    en.wikipedia.org/wiki/Coded_aperture

    Coded apertures or coded-aperture masks are grids, gratings, or other patterns of materials opaque to various wavelengths of electromagnetic radiation. The wavelengths are usually high-energy radiation such as X-rays and gamma rays. A coded "shadow" is cast upon a plane by blocking radiation in a known pattern.