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  2. Moiré pattern - Wikipedia

    en.wikipedia.org/wiki/Moiré_pattern

    In mathematics, physics, and art, moiré patterns (UK: / ˈ m w ɑː r eɪ / MWAH-ray, US: / m w ɑː ˈ r eɪ / mwah-RAY, [1] French: ⓘ) or moiré fringes [2] are large-scale interference patterns that can be produced when a partially opaque ruled pattern with transparent gaps is overlaid on another similar pattern. For the moiré ...

  3. Photomask - Wikipedia

    en.wikipedia.org/wiki/Photomask

    A photomask (also simply called a mask) is an opaque plate with transparent areas that allow light to shine through in a defined pattern. Photomasks are commonly used in photolithography for the production of integrated circuits (ICs or "chips") to produce a pattern on a thin wafer of material (usually silicon ).

  4. DipTrace - Wikipedia

    en.wikipedia.org/wiki/DipTrace

    DipTrace is a proprietary software suite for electronic design automation (EDA) used for electronic schematic capture and printed circuit board layouts. DipTrace has four applications: schematic editor, PCB editor with built-in shape-based autorouter and 3D preview, component editor (schematic symbol), and pattern editor (PCB footprint).

  5. Visual masking - Wikipedia

    en.wikipedia.org/wiki/Visual_masking

    Visual masking involves surrounding a target image (here, the word "radio") with another image. Visual masking is a phenomenon of visual perception. It occurs when the visibility of one image, called a target, is reduced by the presence of another image, called a mask. [1] The target might be invisible or appear to have reduced contrast or ...

  6. Kernel (image processing) - Wikipedia

    en.wikipedia.org/wiki/Kernel_(image_processing)

    In image processing, a kernel, convolution matrix, or mask is a small matrix used for blurring, sharpening, embossing, edge detection, and more. This is accomplished by doing a convolution between the kernel and an image .

  7. Maskless lithography - Wikipedia

    en.wikipedia.org/wiki/Maskless_lithography

    Maskless lithography has two approaches to project a pattern: rasterized and vectorized. In the first one it utilizes generation of a time-variant intermittent image on an electronically modifiable (virtual) mask that is projected with known means (also known as laser direct imaging and other synonyms). In the vectored approach, direct writing ...