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The inclusion of depletion-mode NMOS transistors in the manufacturing process demanded additional manufacturing steps compared to the simpler enhancement-load circuits; this is because depletion-load devices are formed by increasing the amount of dopant in the load transistors channel region, in order to adjust their threshold voltage.
Depletion-load NMOS logic refers to the logic family that became dominant in silicon VLSI in the latter half of the 1970s; the process supported both enhancement-mode and depletion-mode transistors, and typical logic circuits used enhancement-mode devices as pull-down switches and depletion-mode devices as loads, or pull-ups.
The major drawback with NMOS (and most other logic families) is that a direct current must flow through a logic gate even when the output is in a steady state (low in the case of NMOS). This means static power dissipation , i.e. power drain even when the circuit is not switching, leading to high power consumption.
The depletion region has to be closed to enable current to flow. JFETs can have an n-type or p-type channel. In the n-type, if the voltage applied to the gate is negative with respect to the source, the current will be reduced (similarly in the p-type, if the voltage applied to the gate is positive with respect to the source).
In an n-channel "depletion-mode" device, a negative gate-to-source voltage causes a depletion region to expand in width and encroach on the channel from the sides, narrowing the channel. If the active region expands to completely close the channel, the resistance of the channel from source to drain becomes large, and the FET is effectively ...
Therefore, circuit simulators normally use more empirical models (often called compact models) that do not directly model the underlying physics. For example, inversion-layer mobility modeling , or the modeling of mobility and its dependence on physical parameters, ambient and operating conditions is an important topic both for TCAD (technology ...
MOSFET (PMOS and NMOS) demonstrations Date Channel length Oxide thickness [1] MOSFET logic Researcher(s) Organization Ref; June 1960: 20,000 nm: 100 nm: PMOS: Mohamed M. Atalla, Dawon Kahng: Bell Telephone Laboratories [2] [3] NMOS: 10,000 nm: 100 nm: PMOS Mohamed M. Atalla, Dawon Kahng: Bell Telephone Laboratories [4] NMOS May 1965: 8,000 nm ...
For the n-channel depletion MOS transistor, a sufficient negative V GS will deplete (hence its name) the conductive channel of its free electrons switching the transistor “OFF”. Likewise for a p-channel "depletion-mode" MOS transistor a sufficient positive gate-source voltage will deplete the channel of its free holes, turning it “OFF”.