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One example of deposition is the process by which, in sub-freezing air, water vapour changes directly to ice without first becoming a liquid. This is how frost and hoar frost form on the ground or other surfaces. Another example is when frost forms on a leaf. For deposition to occur, thermal energy must be removed from a gas.
Deposition is the geological process in which sediments, soil and rocks are added to a landform or landmass. Wind, ice, water, and gravity transport previously weathered surface material, which, at the loss of enough kinetic energy in the fluid, is deposited, building up layers of sediment.
Sediment transport is important in the fields of sedimentary geology, geomorphology, civil engineering, hydraulic engineering and environmental engineering (see applications, below). Knowledge of sediment transport is most often used to determine whether erosion or deposition will occur, the magnitude of this erosion or deposition, and the time ...
In chemistry, deposition occurs when molecules settle out of a solution. Deposition can be defined as the process of direct transition of a substance from its gaseous form, on cooling, into a solid state without passing through the intermediate liquid state. [1] Deposition can be viewed as a reverse process to dissolution or particle re ...
Ion beam deposition (IBD) is a process of applying materials to a target through the application of an ion beam. [1] Ion beam deposition setup with mass separator. An ion beam deposition apparatus typically consists of an ion source, ion optics, and the deposition target. Optionally a mass analyzer can be incorporated. [2]
The initial stages of the deposition process can be described with the rate equation [1] d Γ d t = k c {\displaystyle {d\Gamma \over dt}=kc} where Γ {\displaystyle \Gamma } ; is the number density of deposited particles, t {\displaystyle t} is the time, c {\displaystyle c} the particle number concentration, and k {\displaystyle k} the ...
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During atomic layer deposition, a film is grown on a substrate by exposing its surface to alternate gaseous species (typically referred to as precursors or reactants). In contrast to chemical vapor deposition, the precursors are never present simultaneously in the reactor, but they are inserted as a series of sequential, non-overlapping pulses.