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Argon is commonly used in insulated glazing as it is the most affordable. Krypton, which is considerably more expensive, is not generally used except to produce very thin double glazing units or extremely high performance triple-glazed units. Xenon has found very little application in IGUs because of cost. [11]
Most windows use argon (which is cheaper), but krypton is a better choice of insulation when the distance between the panes has to be smaller (the distance has to be about 13 mm (1 ⁄ 2 inch) for argon, and about 9 mm (3 ⁄ 8 inch) for krypton; increasing or decreasing the space will degrade performance).
[1] [2] There are newer glass blocks injected with argon gas and having a layer of low-emissivity glass between the halves, which increases the insulative (U) value to 1.5 W/m 2 ·K, which is between triple glazed windows (1.8 W/m 2 ·K) and specialty double glazed windows with advanced frame and coatings(1.2 W/m 2 ·K).
Krypton is the buffer gas used in conjunction with the mercury which is used to moderate the momentum of collisions of mercury ions in order to reduce the damage done to the electrodes in the fluorescent lamp. Generally speaking, the longest lasting lamps are those with the heaviest noble gases as buffer gases.
The sputtering gas is often an inert gas such as argon. For efficient momentum transfer, the atomic weight of the sputtering gas should be close to the atomic weight of the target, so for sputtering light elements neon is preferable, while for heavy elements krypton or xenon are used. [3] Reactive gases can also be used to sputter compounds.
Quadruple glazing is a subset of multipane (multilayer) glazing systems. Multipane glazing with up to six panes is commercially available. [1] Multipane glazing improves thermal comfort (by reducing downdraft convection currents adjacent to the windowpane), and it can reduce greenhouse gas emissions by
A krypton fluoride laser (KrF laser) is a particular type of excimer laser, [1] which is sometimes (more correctly) called an exciplex laser. With its 248 nanometer wavelength, it is a deep ultraviolet laser which is commonly used in the production of semiconductor integrated circuits , industrial micromachining, and scientific research.
The stages of blowing remove carbon by the combination of oxygen and carbon forming CO gas. 4 Cr (bath) + 3 O 2 → 2 Cr 2 O 3 Cr 2 O 3(slag) + 3 C (bath) → 3 CO (gas) + 2 Cr (bath) To drive the reaction to the forming of CO, the partial pressure of CO is lowered using argon or nitrogen. Since the AOD vessel is not externally heated, the ...