Search results
Results From The WOW.Com Content Network
Optical Lithography (or photolithography) is one of the most important and prevalent sets of techniques in the nanolithography field. Optical lithography contains several important derivative techniques, all that use very short light wavelengths in order to change the solubility of certain molecules, causing them to wash away in solution, leaving behind a desired structure.
Lithography was invented by Alois Senefelder [1] in the Electorate of Bavaria in 1796. In the early days of lithography, a smooth piece of limestone was used (hence the name "lithography": "lithos" (λιθος) is the Ancient Greek word for "stone"). After the oil-based image was put on the surface, a solution of gum arabic in water was applied ...
Computational lithography means the use of computers to simulate printing of micro-lithography structures. Pioneering work was done by Chris Mack at NSA in developing PROLITH, Rick Dill at IBM and Andy Neureuther at University of California, Berkeley from the early 1980s. These tools were limited to lithography process optimization as the ...
The root words photo, litho, and graphy all have Greek origins, with the meanings 'light', 'stone' and 'writing' respectively. As suggested by the name compounded from them, photolithography is a printing method (originally based on the use of limestone printing plates) in which light plays an essential role.
Nanoimprint lithography (NIL) is a method of fabricating nanometer-scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes.
The reason for this has more to do with how it is compared to other techniques rather than any inherent weaknesses. For example, the soft lithography method, microcontact printing (μCP), is the current standard for low cost, bench-top micro and nanoscale patterning, so it is easy to understand why DPN is compared directly to microcontact ...
New chip designs involve more stacking of chips together, which makes alignment - for which metrology tools such as those manufactured by Nearfield are needed - more important. (Reporting by Toby ...
This is a factor of about 10 million times slower than current optical lithography tools. It is clear that throughput is a serious limitation for electron beam lithography, especially when writing dense patterns over a large area. E-beam lithography is not suitable for high-volume manufacturing because of its limited throughput.