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  2. Ion implantation - Wikipedia

    en.wikipedia.org/wiki/Ion_implantation

    Ion implantation is a low-temperature process by which ions of one element are accelerated into a solid target, thereby changing the target's physical, chemical, or electrical properties. Ion implantation is used in semiconductor device fabrication and in metal finishing, as well as in materials science research.

  3. Plasma-immersion ion implantation - Wikipedia

    en.wikipedia.org/wiki/Plasma-immersion_ion...

    PIII-process with ECR-plasma source and magnetron. Plasma-immersion ion implantation (PIII) [1] or pulsed-plasma doping (pulsed PIII) is a surface modification technique of extracting the accelerated ions from the plasma by applying a high voltage pulsed DC or pure DC power supply and targeting them into a suitable substrate or electrode with a semiconductor wafer placed over it, so as to ...

  4. Dopant activation - Wikipedia

    en.wikipedia.org/wiki/Dopant_Activation

    In the most common industrial example, rapid thermal processing is applied to silicon following the ion implantation of dopants such as phosphorus, arsenic and boron. [2] Vacancies generated at elevated temperature (1200 °C) facilitate the movement of these species from interstitial to substitutional lattice sites while amorphization damage ...

  5. Ion source - Wikipedia

    en.wikipedia.org/wiki/Ion_source

    Electron capture ionization (ECI) is the ionization of a gas phase atom or molecule by attachment of an electron to create an ion of the form A −•.The reaction is + where the M over the arrow denotes that to conserve energy and momentum a third body is required (the molecularity of the reaction is three).

  6. Rapid thermal processing - Wikipedia

    en.wikipedia.org/wiki/Rapid_thermal_processing

    Rapid thermal processing (RTP) is a semiconductor manufacturing process which heats silicon wafers to temperatures exceeding 1,000°C for not more than a few seconds. During cooling wafer temperatures must be brought down slowly to prevent dislocations and wafer breakage due to thermal shock.

  7. Ion beam mixing - Wikipedia

    en.wikipedia.org/wiki/Ion_Beam_Mixing

    Ion beam mixing can be further enhanced by heat spike effects [4] Ion mixing (IM) is essentially similar in result to interdiffusion, hence most models of ion mixing involve an effective diffusion coefficient that is used to characterize thickness of the reacted layer as a function of ion beam implantation over a period of time. [3]

  8. This Is the Best Room Temperature for Sleep for Older Adults ...

    www.aol.com/best-room-temperature-sleep-older...

    New research finds the optimal room temperature range for sleeping for older adults. Here, experts explain the best temperature for sleep.

  9. Plasma parameters - Wikipedia

    en.wikipedia.org/wiki/Plasma_parameters

    All quantities are in Gaussian units except energy and temperature which are in electronvolts.For the sake of simplicity, a single ionic species is assumed. The ion mass is expressed in units of the proton mass, = / and the ion charge in units of the elementary charge, = / (in the case of a fully ionized atom, equals to the respective atomic number).