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Doping of a pure silicon array. Silicon based intrinsic semiconductor becomes extrinsic when impurities such as boron and antimony are introduced.. In semiconductor production, doping is the intentional introduction of impurities into an intrinsic (undoped) semiconductor for the purpose of modulating its electrical, optical and structural properties.
Dopant activation is the process of obtaining the desired electronic contribution from impurity species in a semiconductor host. [1] The term is often restricted to the application of thermal energy following the ion implantation of dopants.
Semiconductor doping with boron, phosphorus, or arsenic is a common application of ion implantation. When implanted in a semiconductor, each dopant atom can create a charge carrier in the semiconductor after annealing. A hole can be created for a p-type dopant, and an electron for an n-type dopant. This modifies the conductivity of the ...
The effect occurs when the electron carrier concentration exceeds the conduction band edge density of states, which corresponds to degenerate doping in semiconductors. In nominally doped semiconductors, the Fermi level lies between the conduction and valence bands. For example, in n-doped semiconductor, as the doping concentration is increased ...
Pure semiconductors that have been altered by the presence of dopants are known as extrinsic semiconductors (see intrinsic semiconductor). Dopants are introduced into semiconductors in a variety of techniques: solid sources, gases, spin on liquid, and ion implanting. See ion implantation, surface diffusion, and solid sources footnote.
Monolayer doping (MLD) in semiconductor production is a well controlled, wafer-scale surface doping technique first developed at the University of California, Berkeley, in 2007. [1] This work is aimed for attaining controlled doping of semiconductor materials with atomic accuracy, especially at nanoscale , which is not easily obtained by other ...
Metal–oxide–semiconductor structure on P-type silicon. Another example of a depletion region occurs in the MOS capacitor. It is shown in the figure to the right, for a P-type substrate. Supposing that the semiconductor initially is charge neutral, with the charge due to holes exactly balanced by the negative charge due to acceptor doping ...
When a semiconductor is doped by Group V elements, they will behave like donors creating free electrons, known as "n-type" doping. When a semiconductor is doped by Group III elements, they will behave like acceptors creating free holes, known as "p-type" doping. The semiconductor materials used in electronic devices are doped under precise ...