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Electronic design automation (EDA), also referred to as electronic computer-aided design (ECAD), [1] is a category of software tools for designing electronic systems such as integrated circuits and printed circuit boards. The tools work together in a design flow that chip designers use to design and analyze entire semiconductor chips.
Technology files and design rules are essential building blocks of the integrated circuit design process. Their accuracy and robustness over process technology, its variability and the operating conditions of the IC—environmental, parasitic interactions and testing, including adverse conditions such as electro-static discharge—are critical in determining performance, yield and reliability.
In computer engineering, a hardware description language (HDL) is a specialized computer language used to describe the structure and behavior of electronic circuits, usually to design application-specific integrated circuits (ASICs) and to program field-programmable gate arrays (FPGAs).
For several years, the Semiconductor Industry Association (SIA) gave this responsibility of coordination to the United States, which led to the creation of an American style roadmap, the National Technology Roadmap for Semiconductors (NTRS). [5] The first semiconductor roadmap, published by the SIA in 1993.
This specification is usually called SEMI [1] E95-0200 standard. It was originally published in February 2000, and the latest technical revision is SEMI E95-1101. [2]This standard addresses the area of processing content with the direct intention of developing common software standards, so that problems involving operator training, operation specifications, and efficient development can be ...
Layout view of a simple CMOS operational amplifier. In integrated circuit design, integrated circuit (IC) layout, also known IC mask layout or mask design, is the representation of an integrated circuit in terms of planar geometric shapes which correspond to the patterns of metal, oxide, or semiconductor layers that make up the components of the integrated circuit.
Listed are many semiconductor scale examples for various metal–oxide–semiconductor field-effect transistor (MOSFET, or MOS transistor) semiconductor manufacturing process nodes. Timeline of MOSFET demonstrations
During the late 1960s engineers at semiconductor companies like Intel used rubylith for the production of semiconductor lithography photomasks. Manually drawn circuit draft schematics of the semiconductor devices made by engineers were transeferred manually onto D-sized vellum sheets by a skilled schematic designer to make a physical layout of the device on a photomask.