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Rapid thermal anneal. Rapid thermal anneal (RTA) in rapid thermal processing is a process used in semiconductor device fabrication which involves heating a single wafer at a time in order to affect its electrical properties. Unique heat treatments are designed for different effects. Wafers can be heated in order to activate dopants, change film ...
Furnaces are capable of processing many wafers at a time but each process can last between several hours and a day. Increasingly, furnace anneals are being supplanted by Rapid Thermal Anneal (RTA) or Rapid Thermal Processing (RTP). This is due to the relatively long thermal cycles of furnaces that causes the dopants that are being activated ...
Heat treating (or heat treatment) is a group of industrial, thermal and metalworking processes used to alter the physical, and sometimes chemical, properties of a material. The most common application is metallurgical. Heat treatments are also used in the manufacture of many other materials, such as glass. Heat treatment involves the use of ...
In metallurgy and materials science, annealing is a heat treatment that alters the physical and sometimes chemical properties of a material to increase its ductility and reduce its hardness, making it more workable. It involves heating a material above its recrystallization temperature, maintaining a suitable temperature for an appropriate ...
In materials science, quenching is the rapid cooling of a workpiece in water, gas, oil, polymer, air, or other fluids to obtain certain material properties. A type of heat treating, quenching prevents undesired low-temperature processes, such as phase transformations, from occurring. It does this by reducing the window of time during which ...
The company is both a manufacturer and supplier in the market of semiconductor equipment globally. Its main products are dry strip system, rapid thermal processing, as well as etching. The company provides products for customers and manufacturers such as foundries, memory and logic devices. [1] [2]
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Thermal oxidation. Process creating a thin layer of (usually) silicon dioxide. Furnaces used for diffusion and thermal oxidation at LAAS technological facility in Toulouse, France. In microfabrication, thermal oxidation is a way to produce a thin layer of oxide (usually silicon dioxide) on the surface of a wafer.