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Piranha solution, also known as piranha etch, is a mixture of sulfuric acid (H2SO4) and hydrogen peroxide (H2O2). The resulting mixture is used to clean organic residues off substrates, for example silicon wafers. [1] Because the mixture is a strong oxidizing agent, it will decompose most organic matter, and it will also hydroxylate most ...
Step 1: Pour about a cup of baking soda down the shower drain, followed by an equal amount of distilled white vinegar. Allow the solution to bubble and foam for a few minutes. Allow the solution ...
The RCA clean is a standard set of wafer cleaning steps which need to be performed before high-temperature processing steps (oxidation, diffusion, CVD) of silicon wafers in semiconductor manufacturing. Werner Kern developed the basic procedure in 1965 while working for RCA, the Radio Corporation of America. [1][2][3] It involves the following ...
A 12% solution is widely used in waterworks for the chlorination of water, and a 15% solution is more commonly [39] used for disinfection of waste water in treatment plants. Sodium hypochlorite can also be used for point-of-use disinfection of drinking water, [ 40 ] taking 0.2–2 mg of sodium hypochlorite per liter of water.
Chemical drain cleaners. Chemical drain cleaners or openers are pure or mixtures of chemicals used to unclog drains that are blocked by hair, food, or other organic materials. They are often accompanied by other mechanical drain cleaners for the optimal effect. Chemical drain cleaners are available through hardware stores, although some may be ...
A hot water solution containing 73.1% (mass) of NaOH is a eutectic that solidifies at about 62.63 °C as an intimate mix of anhydrous and monohydrate crystals. [ 19 ] [ 18 ] A second stable eutectic composition is 45.4% (mass) of NaOH, that solidifies at about 4.9 °C into a mixture of crystals of the dihydrate and of the 3.5-hydrate.
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